Metallux MetPot slide potentiometer are represented for many years successfully on the market. Metallux MetPot slide potentiometer are represented for many years successfully on the market. With these sensors, for example, be measured translational and Rotary movements in machine and plant construction, as well as increasingly in the automotive. While the MetPot slide potentiometer because they characterized building just a very long service life. Slide potentiometer consist of a thin film to a high-impedance resistance is printed, and a collector film with a low-impedance path of the collector.
Substrate and foil are separated by a spacer, the spacer. A mechanical pressure piece brings the resistance layer with the collector in contact. The grinder system of classical potentiometer is thus replaced by collector slide and saddle. In this way the respective location dependent voltage is accessible off as with any other conventional potentiometer. Wear or abrasion resistance coating can not occur. The Application areas of the slide potentiometer will be extended.
So far, slide potentiometer were built in slide slide technology and characterized by their extremely flat design of less than 2 mm. Only drawback is the relatively high non-linearity of about 1%. At the new generation MetPot film potentiometers the resistance foil is now replaced by a FR4 substrate. This offers several advantages. A, resistor pastes can be used, which allow extremely high service life data from more than 25 million cycles. On the other hand, the use of FR4 head plates material as a carrier allows a linearization of the resistance layer. Linearity values between +/-0.4% (measurement length 50 mm) and +/-0.3% (measuring length 500 mm) are therefore possible. Therefore, the slide potentiometer regarding the accuracy can be quite compared to classic grinder potentiometers. The use of 1 mm thick FR4 head plates material as the basis for the resistance layer in comparison to a thin film has also the advantage that irregularities or Contamination of the substrate does not influence the measurement result.